Covalent Patterning of 2D MoS2

Language
en
Document Type
Article
Issue Date
2021-08-18
Issue Year
2021
Authors
Chen, Xin
Kohring, Malte
Assebban, M’hamed
Tywoniuk, Bartłomiej
Bartlam, Cian
Moses Badlyan, Narine
Maultzsch, Janina
Duesberg, Georg
Weber, Heiko
Knirsch, Kathrin
Editor
Abstract

The development of an efficient method to patterning 2D MoS2 into a desired topographic structure is of particular importance to bridge the way towards the ultimate device. Herein, we demonstrate a patterning strategy by combining the electron beam lithography with the surface covalent functionalization. This strategy allows us to generate delicate MoS2 ribbon patterns with a minimum feature size of 2 m in a high throughput rate. The patterned monolayer MoS2 domain consists of a spatially well-defined heterophase homojunction and alter- nately distributed surface characteristics, which holds great interest for further exploration of MoS2 based devices.

Journal Title
Chemistry - A European Journal
Volume
27
Citation

Chemistry - A European Journal (2021): [early view]. https://chemistry-europe.onlinelibrary.wiley.com/doi/10.1002/chem.202102021

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