Resonant metamaterials for contrast enhancement in optical lithography

Language
en
Document Type
Article
Issue Date
2012-10-10
Issue Year
2012
Authors
Dobmann, Sabine
Shyroki, Dzmitry
Banzer, Peter
Erdmann, Andreas
Peschel, Ulf
Editor
Abstract

The transmission through ultra-thin metal films is noticeable and thus limits their potential for the formation of lithographic masks. By sub-wavelength patterning of a metal film with a post structure, a resonant metamaterial is formed, which can effectively suppress the transmission. Measurements as well as calculations identify the width of the metal islands as a critical geometrical feature. Hence, the extraordinarily low transmission effect can be explained by the resonant response of single scatterers known as Localized Surface Plasmon Resonances (LSPR). A potential application of this suppressed transmission effect to thin metal masks in optical lithography is experimentally investigated.

Journal Title
Optics Express 20.18 (2012): S. 19928-19935. 10.10.2012 <http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-20-18-19928>
Citation
Optics Express 20.18 (2012): S. 19928-19935. 10.10.2012 <http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-20-18-19928>
DOI
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